Orvek, Kevin: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography

Raghunathan, Sudhar, Zurbrick, Larry S., Montgomery, M. Warren, Munder, Adam, Hartley, John, Sohn, Jaewoong, Orvek, Kevin

Year:

2009

Language:

english

File:

PDF, 1000 KB

english, 2009

2

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - SEMATECH EUVL mask program status

Yun, Henry, Hosono, Kunihiro, Goodwin, Frank, Huh, Sungmin, Orvek, Kevin, Cha, Brian, Rastegar, Abbas, Kearney, Patrick

Year:

2009

Language:

english

File:

PDF, 746 KB

english, 2009

3

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - SEMATECH mask program

Yun, Henry, Behringer, Uwe F. W., Rastegar, Abbas, Kearney, Patrick, Orvek, Kevin

Year:

2009

Language:

english

File:

PDF, 233 KB

english, 2009

4

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Progress in 157-nm lithography development at Intel: resists and reticles

Rao, Veena, Panning, Eric M., Liao, Ling, Hutchinson, John M., Grenville, Andrew, Holl, Susan M., Bruner, Don, Balasubramanian, Raghu, Kuse, Ronald, Dao, Giang T., Zheng, Jun-Fei, Orvek, Kevin J., Lan

Year:

2000

Language:

english

File:

PDF, 3.58 MB

english, 2000

5

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Migrating deep-UV lithography to the 0.25-um regime: issues and outlook

Orvek, Kevin J., Dass, Sasha K., Gruber, Len, Dumford, Scott A., Piasecki, MaryAnn, Pollard, Gregory W., Fink, Ian D., Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 627 KB

english, 1996

6

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Resists For Use In 248 Nm Excimer Laser Lithography

Orvek, Kevin J., Palmer, Shane R., Garza, Cesar M., Fuller, Gene E., Willson, C. Grant

Year:

1986

Language:

english

File:

PDF, 6.19 MB

english, 1986

7

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness

Orvek, Kevin, Hosono, Kunihiro, Sohn, Jaewoong, Choi, Jin, Engelstad, Roxann, Raghunathan, Sudharshanan, Zimmerman, John, Laursen, Thomas, Shusuke, Yoshitake, Shoki, Tsutomu

Year:

2009

Language:

english

File:

PDF, 1.01 MB

english, 2009

8

Neutralization in ion-surface collisions II. Nonperturbative results

C.A. Moyer, Kevin Orvek

Journal:

Surface Science Letters

Year:

1982

Language:

english

File:

PDF, 59 KB

english, 1982

9

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Electrostatic chucking of EUVL reticles

Nataraju, Madhura, Lercel, Michael J., Sohn, Jaewoong, Mikkelson, Andrew R., Engelstad, Roxann L., Turner, Kevin T., Van Peski, Chris K., Orvek, Kevin J.

Year:

2007

Language:

english

File:

PDF, 629 KB

english, 2007

10

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Characterization of positive DUV resists at 0.25-μm polygate using organic and inorganic antireflection schemes

Dass, Sasha K., Orvek, Kevin J., Gruber, Len, Broomfield, Mike C., Tremblay, John, Piasecki, MaryAnn, Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 1014 KB

english, 1997

11

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Current status of 157-nm mask technology development

Dao, Giang T., Kuse, Ronald, Orvek, Kevin J., Panning, Eric M., Remling, Roswitha, Zheng, Jun-Fei, Tsubosaki, Munehiko, Lo, Fu-Chang, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 2.71 MB

english, 2000

12

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Comparison of I-line and deep-UV technologies for 0.35-um lithography

Orvek, Kevin J., Ferrari, Joseph J., Dass, Sasha K., Corliss, Daniel A., Buchanan, James R., Piasecki, MaryAnn, Brunner, Timothy A.

Year:

1994

Language:

english

File:

PDF, 455 KB

english, 1994

13

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Clean mask shipping module development and demonstration for EUVL masks and blanks

Yan, Pei-Yang, Hoga, Morihisa, He, Long, Ma, Andy, Orvek, Kevin

Year:

2006

Language:

english

File:

PDF, 196 KB

english, 2006

14

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Marathon evaluation of optical materials for 157-nm lithography

Liberman, Vladimir, Rothschild, Mordechai, Efremow, Jr., N. N., Palmacci, Stephen T., Sedlacek, Jan H. C., Van Peski, Chris K., Orvek, Kevin J., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 215 KB

english, 2001

15

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Development of polymer membranes for 157-nm lithography

Eschbach, Florence, Tregub, Alex, Orvek, Kevin, Foster, Corey, Lo, Fu-Chang, Matsukura, Ikuo, Tsushima, Nana, Smith, Bruce W.

Year:

2004

Language:

english

File:

PDF, 1.04 MB

english, 2004

16

SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Integrated Circuit Metrology, Inspection, and Process Control V - 0.50 μm contact measurement and characterization

Lindsay, Tracy K., Orvek, Kevin J., Mumaw, Richard T., Arnold, William H.

Year:

1991

Language:

english

File:

PDF, 802 KB

english, 1991

17

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Status and path to a final EUVL reticle-handling solution

He, Long, Lercel, Michael J., Orvek, Kevin, Seidel, Phil, Wurm, Stefan, Underwood, Jon, Betancourt, Ernie

Year:

2007

Language:

english

File:

PDF, 792 KB

english, 2007

18

An organosilicon photoresist for use in excimer laser lithography

Kevin J. Orvek, Wells C. Cunningham Jr., Janet C. McFarland

Journal:

Microelectronic Engineering

Year:

1987

Language:

english

File:

PDF, 346 KB

english, 1987

19

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - Evaluation Of An Organosilicon Photoresist For Excimer Laser Lithography

McFarland, Janet C., Orvek, Kevin J., Ditmer, Gary A., MacDonald, Scott A.

Year:

1988

Language:

english

File:

PDF, 7.33 MB

english, 1988

20

Neutralization in ion-surface collisions

C.A. Moyer, Kevin Orvek

Journal:

Surface Science Letters

Year:

1982

Language:

english

File:

PDF, 50 KB

english, 1982

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Protection efficiency of a standard compliant EUV reticle handling solution

He, Long, Schellenberg, Frank M., La Fontaine, Bruno M., Lystad, John, Wurm, Stefan, Orvek, Kevin, Sohn, Jaewoong, Ma, Andy, Kearney, Patrick, Kolbow, Steve, Halbmaier, David

Year:

2009

Language:

english

File:

PDF, 1.01 MB

english, 2009

22

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Deep Uv And Thermal Hardening Of Novolak Resists

Orvek, Kevin J., Dennis, Michael L., Bowden, Murrae J.

Year:

1987

Language:

english

File:

PDF, 3.37 MB

english, 1987

23

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Long-term testing of optical components for 157-nm lithography

Liberman, Vladimir, Rothschild, Mordechai, Sedlacek, Jan H. C., Uttaro, Ray S., Bates, Allen K., Orvek, Kevin J., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 337 KB

english, 2000

24

Carbonized layer formation in ion implanted photoresist masks

Kevin J. Orvek, Craig Huffman

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1985

Language:

english

File:

PDF, 712 KB

english, 1985

25

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Extreme ultraviolet resist outgassing and its effect on nearby optics

Denbeaux, Gregory, Garg, Rashi, Mbanaso, Chimaobi, Waterman, Justin, Yankulin, Leonid, Antohe, Alin, Fan, Yu-Jen, Montgomery, Warren, Dean, Kim, Orvek, Kevin, Wüest, Andrea, Wei, Yayi, Goodwin, Frank,

Year:

2008

Language:

english

File:

PDF, 175 KB

english, 2008

26

SPIE Proceedings [SPIE 1984 Microlithography Conferences - Santa Clara (Monday 12 March 1984)] Advances in Resist Technology I - Some Aspects Of Anti-Reflective Coating For Optical Lithography

Lin, Yi-Ching, Marriott, Vic, Orvek, Kevin, Fuller, Gene, Willson, C. Grant

Year:

1984

Language:

english

File:

PDF, 4.11 MB

english, 1984

27

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Status of EUVL reticle chucking

Engelstad, Roxann L., Sohn, Jaewoong, Zeuske, Jacob R., Battula, Venkata Siva, Vukkadala, Pradeep, Van Peski, Chris K., Orvek, Kevin J., Turner, Kevin T., Mikkelson, Andrew R., Nataraju, Madhura

Year:

2008

Language:

english

File:

PDF, 788 KB

english, 2008

28

Neutralization in ion-surface collisions: II. Nonperturbative results

C.A. Moyer, Kevin Orvek

Journal:

Surface Science

Year:

1982

Language:

english

File:

PDF, 1.04 MB

english, 1982

29

Neutralization in ion-surface collisions

C.A. Moyer, Kevin Orvek

Journal:

Surface Science

Year:

1982

Language:

english

File:

PDF, 968 KB

english, 1982

30

Protection schemes for critical surface in vacuum environments

Kim, Jung Hyeun, Asbach, Christof, Yook, Se-Jin, Fissan, Heinz, Orvek, Kevin J., Ramamoorthy, Arun, Yan, Pei-Yang, Pui, David Y. H.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2005

Language:

english

File:

PDF, 397 KB

english, 2005

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography

He, Long, Schellenberg, Frank M., Wurm, Stefan, Seidel, Phil, Orvek, Kevin, Betancourt, Ernie, Underwood, Jon

Year:

2008

Language:

english

File:

PDF, 944 KB

english, 2008

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